Engineering & Materials Science
Gate dielectrics
100%
Oxides
77%
Interface states
75%
Substrates
64%
Metals
61%
Leakage currents
58%
Plasmas
54%
Electric potential
50%
Annealing
48%
Defects
44%
High-k dielectric
41%
Charge trapping
38%
Silicon
38%
Deuterium
34%
Aluminum oxide
34%
MOS capacitors
29%
Reactive ion etching
28%
Nitridation
28%
Silicates
27%
Temperature
27%
Electric breakdown
27%
Degradation
26%
MOS devices
25%
Thin films
25%
Capacitors
23%
Electrons
22%
Oxidation
22%
Deep level transient spectroscopy
20%
Magnetic fields
20%
Electron traps
20%
Electron energy levels
19%
Electrodes
19%
Antennas
18%
Atomic layer deposition
18%
FinFET
18%
Plasma applications
17%
Hot carriers
17%
Negative bias temperature instability
17%
Hafnium
17%
Oxide semiconductors
17%
Permittivity
17%
Electron injection
17%
Capacitance
16%
Sensors
16%
Passivation
16%
Germanium
16%
Capacitance measurement
16%
Hot electrons
15%
Carrier transport
15%
Doping (additives)
15%
Chemical Compounds
Dielectric Material
62%
Leakage Current
54%
Interface State
49%
Voltage
43%
Oxide
32%
Capacitor
31%
Etching
21%
Plasma
20%
Annealing
18%
Metal
17%
Trap Density Measurement
16%
Field Effect
16%
Liquid Film
15%
Point Group C∞V
13%
Electron Particle
12%
Dielectric Constant
11%
Deuterium(.)
11%
Hysteresis
10%
Hafnium Atom
10%
Semiconductor
10%
Electron Trap
10%
Atomic Layer Epitaxy
10%
Compound Mobility
9%
Drain Current
9%
Conductance
9%
Energy
8%
Simulation
8%
Reaction Activation Energy
8%
Electrical Property
7%
Ion
7%
Breakdown Voltage
7%
Evaporation
6%
Tunneling
6%
Reduction
6%
Dielectric Property
6%
Deep Trap
5%
Oxidation Reaction
5%
Figure of Merit
5%
Dioxygen
5%
Interface Trap
5%
Deep Level Transient Spectroscopy
5%
Dielectric Film
5%
Electric Field
5%
Ambient Reaction Temperature
5%
Shallow Trap
5%
Hot Electron
5%
Deposition Process
5%
Physics & Astronomy
traps
20%
leakage
19%
field effect transistors
18%
oxides
16%
electric potential
14%
defects
13%
thin films
13%
metals
13%
low frequencies
12%
capacitors
11%
silicon
11%
plasma antennas
11%
trapping
10%
conduction
10%
temperature
10%
metal oxide semiconductors
9%
capacitance
9%
damage
9%
etching
9%
annealing
8%
insulators
8%
breakdown
8%
deuterium
8%
slots
7%
dielectric properties
7%
plasma etching
7%
injection
7%
oxygen
6%
energy levels
6%
electrons
6%
solar cells
6%
implantation
5%
inversions
5%
spectroscopy
5%
electrical measurement
5%
electrical properties
5%
electrodes
5%
