Keyphrases
Processing System
100%
Wafer
100%
Rapid Thermal Processing
100%
Closed-loop Control
100%
Emissivity
100%
Infrared Imaging
50%
Accurate Method
50%
Extended Kalman Filtering
50%
Nonlinear Control Problem
50%
Temperature Data
50%
Imaging Pyrometer
50%
Sapphire Window
50%
Extended Kalman Filter Algorithm
50%
Nonlinear Dynamic Model
50%
Nonlinear Estimation Problems
50%
Temperature Effect
50%
Semiconductor Wafer
50%
Multivariable Feedback Control
50%
Semiconductors
50%
Thermocouple
50%
Control Problem
50%
Closed-loop Controller
50%
Tolerance Band
50%
Required Temperature
50%
High Power
50%
Electronic Imaging
50%
Multi-wavelength
50%
Tungsten Halogen Lamp
50%
Curing Temperature
50%
Wafer Temperature
50%
Engineering
Closed Loop Control
50%
Extended Kalman
50%
Rapid Thermal Processing
50%
Processing System
50%
Emissivity
50%
Emissivity
50%
Fits and Tolerances
25%
Filtration
25%
Dynamic Models
25%
Feedback Control System
25%
Curing Temperature
25%
Thermocouple
25%
Closed Loop
25%
Filtering Algorithm
25%
Temperature Dependence
25%
Non-Linear Dynamic
25%
Loop Controller
25%
Temperature Data
25%
Feedback Control
25%