A comparative study of plasma enhanced chemically vapor deposited Si-O-H and Si-N-C-H films using the environmentally benign precursor diethylsilane

R. A. Levy, L. Chen, J. M. Grow, Y. Yu

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Fingerprint

Dive into the research topics of 'A comparative study of plasma enhanced chemically vapor deposited Si-O-H and Si-N-C-H films using the environmentally benign precursor diethylsilane'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds