Keyphrases
Memory Device
100%
Superlattices
100%
Nanocrystalline Silicon
100%
Resonant Tunneling
100%
Room Temperature
50%
Non-volatile
50%
Low Bias
50%
Quantum Structures
50%
Nanocrystal Size
50%
Non-volatile Memory
50%
Silicon Dioxide
50%
Si-SiO2
50%
Nanometer Size
50%
Hot Electrons
50%
Capacitance Technique
50%
Si Technology
50%
Silicon Layer
50%
Retention Time
50%
Degradation Effect
50%
Silicon Nanocrystallites
50%
Capacitance Method
50%
Size Dispersion
50%
Strong Potential
50%
Long Retention Time
50%
Dynamic Memory
50%
Electron Tunneling
50%
Constant Voltage
50%
Engineering
Nanocrystalline
100%
Resonant Tunneling
100%
Retention Time
100%
Nanometre
50%
Room Temperature
50%
Nonvolatile Memory
50%
Tunnel Construction
50%
Hot Electron
50%
Constant Voltage
50%
Silicon Layer
50%
Requirement Standard
50%
Bias Operation
50%
Material Science
Silicon
100%
Superlattice
100%
Nanocrystalline Silicon
100%
Capacitance
66%
Nanocrystalline Material
33%
Silicon Dioxide
33%
Nanocrystallites
33%
Hot Electron
33%