A method and apparatus for surface modification by gas-cluster ion impact

J. A. Northby, T. Jiang, G. H. Takaoka, I. Yamada, W. L. Brown, M. Sosnowski

Research output: Contribution to journalArticlepeer-review

20 Scopus citations

Abstract

We report here a preliminary study of the effects of Ar cluster ions of relatively low energy (15 → 30 keV) on Si surfaces and on Au films deposited on Si. The cluster size distribution was measured by time of flight and retarding potential methods. The mean cluster size was varied between 150 and 600 atoms so that the mean energy per atom in a cluster was of the order of 100 eV. The irradiated samples were analyzed by RBS and channeling and their surfaces were examined with SEM.

Original languageEnglish (US)
Pages (from-to)336-340
Number of pages5
JournalNuclear Inst. and Methods in Physics Research, B
Volume74
Issue number1-2
DOIs
StatePublished - Apr 2 1993

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Instrumentation

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