A New LPCVD Technique of Producing Borophosphosilicate Glass Films by Injection of Miscible Liquid Precursors

Keyphrases

• Low Pressure Chemical Vapor Deposition (LPCVD) 100%
• Solution Composition 100%
• Glass Film 100%
• Borophosphosilicate Glass 100%
• Miscible Fluids 100%
• Liquid Precursor 100%
• Temperature Concentration 50%
• Growth Rate 50%
• Flow Profile 50%
• Deposition Conditions 50%
• Stoichiometry 50%
• Silica 50%
• Growth Composition 50%
• Aspect Ratio 50%
• Dielectric Constant 50%
• Injection Rate 50%
• Relative Effect 50%
• Total Pressure 50%
• Liquid Mixtures 50%
• Deposition Temperature 50%
• Step Coverage 50%
• Phosphate Glass 50%
• Film Composition 50%
• Phosphorus Concentration 50%
• Compositional Uniformity 50%
• Reaction Chemistry 50%
• Starting Solutions 50%
• High Phosphorus 50%
• High Boron 50%
• Composition Rate 50%
• Boron Levels 50%
• Pressure Solution 50%
• Phosphorus Levels 50%
• Depletion Effect 50%

Engineering

• Liquid Precursor 100%
• Dielectrics 50%
• Deposition Condition 50%
• Aspect Ratio 50%
• Constant Value 50%
• Injection Rate 50%
• Deposition Temperature 50%
• Phosphorus Concentration 50%

Material Science

• Film 100%
• Low Pressure Chemical Vapor Deposition 100%
• Permittivity 20%
• Boron 20%