Abstract
The void electromigration process in the strip geometry is investigated analytically and numerically. The void is assumed to travel either along the axis of symmetry of the metal strip or at the boundary. In each case, the shape, the velocity of the void and the characteristic electrical current are predicted.
Original language | English (US) |
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Pages (from-to) | 279-289 |
Number of pages | 11 |
Journal | Computational Materials Science |
Volume | 17 |
Issue number | 2-4 |
DOIs | |
State | Published - Jun 2000 |
Externally published | Yes |
All Science Journal Classification (ASJC) codes
- General Computer Science
- General Chemistry
- General Materials Science
- Mechanics of Materials
- General Physics and Astronomy
- Computational Mathematics