Keyphrases
Low Pressure Chemical Vapor Deposition (LPCVD)
100%
Metal-organic Materials
100%
Aluminum Film
100%
Resistivity
33%
Pyrolysis
33%
Silicon Wafer
33%
Silica
33%
Metallization
33%
Surface Roughness
33%
Very Large Scale Integration
33%
Transmission Electron Microscopy
33%
Pure Aluminum
33%
Integrated Device
33%
Step Coverage
33%
Columnar Grain
33%
Aluminum Alkyl
33%
Fiber Texture
33%
Device Wafer
33%
Electron Microscopy Examination
33%
Surface Activation
33%
Activation Treatment
33%
Optical Reflectivity
33%
Triisobutylaluminum
33%
Material Science
Film
100%
Low Pressure Chemical Vapor Deposition
100%
Aluminum
100%
Silicon
12%
Transmission Electron Microscopy
12%
Electrical Resistivity
12%
Reflectivity
12%
Surface Roughness
12%