Aluminum films prepared by metal-organic low pressure chemical vapor deposition

Keyphrases

• Low Pressure Chemical Vapor Deposition (LPCVD) 100%
• Metal-organic Materials 100%
• Aluminum Film 100%
• Resistivity 33%
• Pyrolysis 33%
• Silicon Wafer 33%
• Silica 33%
• Metallization 33%
• Surface Roughness 33%
• Very Large Scale Integration 33%
• Transmission Electron Microscopy 33%
• Pure Aluminum 33%
• Integrated Device 33%
• Step Coverage 33%
• Columnar Grain 33%
• Aluminum Alkyl 33%
• Fiber Texture 33%
• Device Wafer 33%
• Electron Microscopy Examination 33%
• Surface Activation 33%
• Activation Treatment 33%
• Optical Reflectivity 33%
• Triisobutylaluminum 33%

Material Science

• Film 100%
• Low Pressure Chemical Vapor Deposition 100%
• Aluminum 100%
• Silicon 12%
• Transmission Electron Microscopy 12%
• Electrical Resistivity 12%
• Reflectivity 12%
• Surface Roughness 12%