Application of transmission electron detection to SCALPEL mask metrology

R. C. Farrow; M. T. Postek; W. J. Keery; S. N. Jones; J. R. Lowney; M. Blakey; L. A. Fetter; J. E. Griffith; J. A. Liddle; L. C. Hopkins; H. A. Huggins; M. Peabody; A. Novembre

doi:10.1116/1.589346

Application of transmission electron detection to SCALPEL mask metrology

R. C. Farrow, M. T. Postek, W. J. Keery, S. N. Jones, J. R. Lowney, M. Blakey, L. A. Fetter, J. E. Griffith, J. A. Liddle, L. C. Hopkins, H. A. Huggins, M. Peabody, A. Novembre

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small as 0.24 μm were measured on the mask. The thin membrane mask structure that was used is found to provide sufficient transmitted signal contrast at energies ranging from 10 to 30 keV. The linewidth measurement accuracy is mostly limited by the variations in the material and not the measurement system. It is concluded that the linewidth measurement technique using transmitted electrons is suitable for the potential certification of SCALPEL mask standards.

Original language	English (US)
Pages (from-to)	2167-2172
Number of pages	6
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	15
Issue number	6
DOIs	https://doi.org/10.1116/1.589346
State	Published - 1997
Externally published	Yes

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.589346

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Farrow, R. C., Postek, M. T., Keery, W. J., Jones, S. N., Lowney, J. R., Blakey, M., Fetter, L. A., Griffith, J. E., Liddle, J. A., Hopkins, L. C., Huggins, H. A., Peabody, M., & Novembre, A. (1997). Application of transmission electron detection to SCALPEL mask metrology. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 15(6), 2167-2172. https://doi.org/10.1116/1.589346

@article{925e441139d2420e9a24ce22043352c8,

title = "Application of transmission electron detection to SCALPEL mask metrology",

abstract = "Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small as 0.24 μm were measured on the mask. The thin membrane mask structure that was used is found to provide sufficient transmitted signal contrast at energies ranging from 10 to 30 keV. The linewidth measurement accuracy is mostly limited by the variations in the material and not the measurement system. It is concluded that the linewidth measurement technique using transmitted electrons is suitable for the potential certification of SCALPEL mask standards.",

author = "Farrow, {R. C.} and Postek, {M. T.} and Keery, {W. J.} and Jones, {S. N.} and Lowney, {J. R.} and M. Blakey and Fetter, {L. A.} and Griffith, {J. E.} and Liddle, {J. A.} and Hopkins, {L. C.} and Huggins, {H. A.} and M. Peabody and A. Novembre",

year = "1997",

doi = "10.1116/1.589346",

language = "English (US)",

volume = "15",

pages = "2167--2172",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "6",

}

Farrow, RC, Postek, MT, Keery, WJ, Jones, SN, Lowney, JR, Blakey, M, Fetter, LA, Griffith, JE, Liddle, JA, Hopkins, LC, Huggins, HA, Peabody, M & Novembre, A 1997, 'Application of transmission electron detection to SCALPEL mask metrology', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 15, no. 6, pp. 2167-2172. https://doi.org/10.1116/1.589346

TY - JOUR

T1 - Application of transmission electron detection to SCALPEL mask metrology

AU - Farrow, R. C.

AU - Postek, M. T.

AU - Keery, W. J.

AU - Jones, S. N.

AU - Lowney, J. R.

AU - Blakey, M.

AU - Fetter, L. A.

AU - Griffith, J. E.

AU - Liddle, J. A.

AU - Hopkins, L. C.

AU - Huggins, H. A.

AU - Peabody, M.

AU - Novembre, A.

PY - 1997

Y1 - 1997

N2 - Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small as 0.24 μm were measured on the mask. The thin membrane mask structure that was used is found to provide sufficient transmitted signal contrast at energies ranging from 10 to 30 keV. The linewidth measurement accuracy is mostly limited by the variations in the material and not the measurement system. It is concluded that the linewidth measurement technique using transmitted electrons is suitable for the potential certification of SCALPEL mask standards.

AB - Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small as 0.24 μm were measured on the mask. The thin membrane mask structure that was used is found to provide sufficient transmitted signal contrast at energies ranging from 10 to 30 keV. The linewidth measurement accuracy is mostly limited by the variations in the material and not the measurement system. It is concluded that the linewidth measurement technique using transmitted electrons is suitable for the potential certification of SCALPEL mask standards.

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JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

ER -

Application of transmission electron detection to SCALPEL mask metrology

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