Artificial dielectrics: Nonlinear optical properties of silicon nanoclusters at λ=532 nm

S. Vijayalakshmi, F. Shen, H. Grebel

Research output: Contribution to journalArticlepeer-review

45 Scopus citations

Abstract

The nonlinear optical responses of laser-ablated Si nanoclusters were measured at λ=532 nm. Re{χ(3)} values as high as -(1.33±0.33) × 10-3 esu were measured for films that were only 200 nm thick. The response time for this nonlinearity was as short as 3.5±0.5 ns, limited by our laser pulse duration.

Original languageEnglish (US)
Pages (from-to)3332-3334
Number of pages3
JournalApplied Physics Letters
Volume71
Issue number23
DOIs
StatePublished - Dec 8 1997

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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