@inproceedings{43f40d04911845a3961a5969e7485b01,
title = "Atomic Layer Deposition and Atomic Layer Etching—An Overview of Selective Processes",
abstract = "The continued evolution in nanoelectronics and nanophotonics has been made possible by the recent developments in Atomic Layer Deposition and Atomic Layer Etching. While uniform deposition of conformal films with controllable thickness is a key feature of Atomic Layer Deposition, Atomic Layer Etching offers the advantages of controlled removal of chemically modified areas. Various case studies of the applications of these technologies in dielectrics, metals and diffusion barriers will be discussed.",
keywords = "Atomic layer deposition, Atomic layer etching, Dielectrics, Diffusion barriers, Metallization, Microelectronics",
author = "Samiha Hossain and Gokce, {Oktay H.} and Ravindra, {N. M.}",
note = "Publisher Copyright: {\textcopyright} 2021, The Minerals, Metals & Materials Society.; 150th Annual Meeting and Exhibition of The Minerals, Metals and Materials Society, TMS 2021 ; Conference date: 15-03-2021 Through 18-03-2021",
year = "2021",
doi = "10.1007/978-3-030-65261-6_20",
language = "English (US)",
isbn = "9783030652609",
series = "Minerals, Metals and Materials Series",
publisher = "Springer Science and Business Media Deutschland GmbH",
pages = "219--229",
booktitle = "TMS 2021 150th Annual Meeting and Exhibition Supplemental Proceedings",
address = "Germany",
}