Atomic Layer Deposition and Atomic Layer Etching—An Overview of Selective Processes

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The continued evolution in nanoelectronics and nanophotonics has been made possible by the recent developments in Atomic Layer Deposition and Atomic Layer Etching. While uniform deposition of conformal films with controllable thickness is a key feature of Atomic Layer Deposition, Atomic Layer Etching offers the advantages of controlled removal of chemically modified areas. Various case studies of the applications of these technologies in dielectrics, metals and diffusion barriers will be discussed.

Original languageEnglish (US)
Title of host publicationTMS 2021 150th Annual Meeting and Exhibition Supplemental Proceedings
PublisherSpringer Science and Business Media Deutschland GmbH
Pages219-229
Number of pages11
ISBN (Print)9783030652609
DOIs
StatePublished - 2021
Event150th Annual Meeting and Exhibition of The Minerals, Metals and Materials Society, TMS 2021 - Pittsburgh, United States
Duration: Mar 15 2021Mar 18 2021

Publication series

NameMinerals, Metals and Materials Series
Volume5
ISSN (Print)2367-1181
ISSN (Electronic)2367-1696

Conference

Conference150th Annual Meeting and Exhibition of The Minerals, Metals and Materials Society, TMS 2021
CountryUnited States
CityPittsburgh
Period3/15/213/18/21

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Energy Engineering and Power Technology
  • Mechanics of Materials
  • Metals and Alloys
  • Materials Chemistry

Keywords

  • Atomic layer deposition
  • Atomic layer etching
  • Dielectrics
  • Diffusion barriers
  • Metallization
  • Microelectronics

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