Atomic layer deposition of TiO 2 on graphene for supercapacitors

Xiang Sun, Ming Xie, Gongkai Wang, Hongtao Sun, Andrew S. Cavanagh, Jonathan J. Travis, Steven M. George, Jie Lian

Research output: Contribution to journalArticlepeer-review

193 Scopus citations


A nano-scaled coating of titanium oxide (TiO 2) on graphene (G) has been achieved via a novel atomic layer deposition (ALD) method. As a potential supercapacitor material, the TiO 2-G composites exhibited a capacity of 75 Fg and 84 Fg at a scan rate of 10 mVs for composites grown using 50 and 100 ALD cycles, respectively. The nearly identical Nyquist plots of the TiO 2-G composites compared with those of pure graphene demonstrated that the composites possess excellent conductivity for charge transfer and open structures for ion diffusion. In addition, even with 3-4 times additional mass loading (maximum 3.22 mgcm 2), the composites exhibit no obvious degradation with respect to the electrochemical performance. This ALD approach presents a promising route to synthesize advanced graphene-based nanocomposites for supercapacitor applications.

Original languageEnglish (US)
Pages (from-to)A364-A369
JournalJournal of the Electrochemical Society
Issue number4
StatePublished - 2012
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Materials Chemistry
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Renewable Energy, Sustainability and the Environment


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