Abstract
Current solid state lamps rely on the use of blue light-emitting diodes (LEDs) and the generation of green/red light by phosphor-based down-conversion process. The aim of this chapter is to provide an overview of the recent development of axial GaN nanowire (NW) - based LEDs. It describes the fabrication and performance characteristics of NW LEDs using the top-down approach. The chapter presents the design, epitaxial growth and performance of typical bottom-up NW LEDs. It also presents various carrier loss processes, including Auger recombination, electron overflow/leakage and surface recombination and their impact on the performance of NW LEDs. The chapter also describes the design and performance characteristics of NW LEDs with the incorporation of p-type modulation doping, electron blocking layer (EBL) and surface passivation techniques. NW LEDs fabricated by the bottom-up approach have been intensively investigated.
Original language | English (US) |
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Title of host publication | Wide Band Gap Semiconductor Nanowires 2 |
Subtitle of host publication | Heterostructures and Optoelectronic Devices |
Publisher | Wiley-Blackwell |
Pages | 105-134 |
Number of pages | 30 |
Volume | 9781848216877 |
ISBN (Electronic) | 9781118984291 |
ISBN (Print) | 9781848216877 |
DOIs | |
State | Published - Sep 15 2014 |
Externally published | Yes |
All Science Journal Classification (ASJC) codes
- General Engineering
Keywords
- Axial GaN
- Bottom-up approach
- Carrier loss processes
- Electron blocking layer (EBL)
- Light-emitting diodes (LEDs)
- Nanowire (NW)
- Top-down approach