Bandgap reduction and photoelectrochemical properties of ZnO:N films deposited by reactive RF magnetron sputtering

Keyphrases

• Annealing 50%
• As-grown 50%
• Band Gap 50%
• Band Gap Reduction 100%
• Color Filtering 50%
• Gas Atmosphere 50%
• High Photocurrent 50%
• Light Absorption 50%
• Long Wavelength 50%
• N Incorporation 100%
• PEC Activity 50%
• PEC Water Splitting 50%
• Photoelectrochemical Properties 100%
• Photoresponse 50%
• Pure Zn 50%
• Reactive RF Magnetron Sputtering 100%
• Reduction Property 100%
• Total Current 50%
• Visible Light Region 100%
• Wavelength Regions 50%
• ZnO Film 100%
• ZnO Thin Films 50%

Engineering

• Deposited Film 100%
• Filtration 50%
• Magnetron 100%
• Photocurrent 50%
• Thin Films 50%
• Water Splitting 50%

Material Science

• Film 100%
• Magnetron Sputtering 100%
• Thin Films 12%
• Water Splitting 12%
• ZnO 100%