Keyphrases
Spectroscopy Studies
100%
X-ray Photoelectron Spectroscopy
100%
Carbide Thin Films
100%
Si-doped
100%
Oxygen-doped
100%
Si Oxide
66%
Phase Mixture
66%
Carbides
66%
Silicon Substrate
33%
P-type
33%
Silicon Carbide Film
33%
Ion Implantation
33%
Oxygen Content
33%
Silica
33%
SiOx
33%
Infrared Spectroscopy
33%
Surface Oxide
33%
C-phase
33%
Multiphase Materials
33%
Thin-film Silicon
33%
Silicon Carbide Surfaces
33%
Si-C
33%
Atomic Fraction
33%
Complex Phase
33%
Chemical Vapor Deposition
33%
(100) Silicon
33%
Atomic Oxygen
33%
Oxygen Fraction
33%
Silicon Carbide
33%
Monocrystalline Silicon
33%
Air Exposure
33%
Near-surface Region
33%
Spectroscopic Analysis
33%
Engineering
Thin Films
100%
Ray Photoelectron Spectroscopy
100%
Phase Mixture
66%
Chemical Vapor Deposition
33%
Vapor Deposition
33%
Silicon Substrate
33%
Ion Implantation
33%
Surface Oxide
33%
Induced Surface
33%
Formed Material
33%
Complex Phase
33%
Monocrystalline Silicon
33%
Surface Region
33%
Oxygen Content
33%
Material Science
Film
100%
Thin Films
100%
Photoemission Spectroscopy
100%
Carbide
100%
Silicon
60%
Silicon Carbide
60%
Oxide Compound
40%
Ion Implantation
20%
Chemical Vapor Deposition
20%
Oxide Surface
20%