Calculation of the transitional pressure region for the reaction SiH3 + O2

S. A. Chasovnikov, L. N. Krasnoperov

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Abstract

We have calculated the transitional pressure region of the recombination reaction SiH3 + O2, starting with hypothetical models of the radical SiH3O2 and estimates of the bond energy of this radical. It is shown that at 300 K the transitional pressure P 1/2 for this reaction is 33-133 Pa (Ar).

Original languageEnglish (US)
Pages (from-to)1125-1130
Number of pages6
JournalKinetics and Catalysis
Volume31
Issue number6 pt 1
StatePublished - May 1 1991
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Catalysis
  • Chemistry(all)
  • Modeling and Simulation
  • Computer Science Applications

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