Abstract
We have calculated the transitional pressure region of the recombination reaction SiH3 + O2, starting with hypothetical models of the radical SiH3O2 and estimates of the bond energy of this radical. It is shown that at 300 K the transitional pressure P 1/2 for this reaction is 33-133 Pa (Ar).
Original language | English (US) |
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Pages (from-to) | 1125-1130 |
Number of pages | 6 |
Journal | Kinetics and Catalysis |
Volume | 31 |
Issue number | 6 pt 1 |
State | Published - May 1991 |
Externally published | Yes |
All Science Journal Classification (ASJC) codes
- Catalysis
- General Chemistry
- Modeling and Simulation
- Computer Science Applications