Characteristics of ultra shallow B implantation with decaborane

Keyphrases

• Ultra-shallow 100%
• Decaborane 100%
• Annealing 50%
• Sputtering Yield 50%
• Cluster Ions 50%
• Equivalent Energy 50%
• Irradiation 25%
• P-type 25%
• Si Surface 25%
• Atomic Force Microscopy 25%
• Crystalline Materials 25%
• Amorphous Si 25%
• Interaction Mechanism 25%
• C-Si 25%
• Ta Films 25%
• Spatial Frequency 25%
• Si Devices 25%
• Depth Profile 25%
• Rough Surface 25%
• Amorphous Materials 25%
• Very Low Energy 25%
• Equivalent Dose 25%
• Crystalline Si 25%
• Power Density Spectrum 25%
• Smoothing Effect 25%
• Beta Distribution 25%
• Ar Ions 25%
• Si Effect 25%
• Ion-surface Interaction 25%

Engineering

• Shallower 100%
• Energy Engineering 66%
• Monomer 66%
• Sputtering Yield 66%
• Polycrystalline 33%
• Power Density 33%
• Si Surface 33%
• Atomic Force Microscopy 33%
• Spatial Frequency 33%
• Depth Profile 33%
• Si Device 33%
• Surface Effect 33%
• Density Spectrum 33%

Material Science

• Crystalline Material 100%
• Amorphous Material 100%
• Boron Ion 100%
• Film 50%
• Density 50%
• Rough Surface 50%
• Secondary Ion Mass Spectrometry 50%