Characterization of laser ablated silicon thin films

S. Vijayalakshmi, Z. Iqbal, M. A. George, J. Federici, H. Grebel

Research output: Contribution to journalArticlepeer-review

14 Scopus citations

Abstract

Using laser ablation, we deposited silicon layers consisting of clusters and crystalline domains onto glass, quartz, aluminum, titanium, copper, single-crystal silicon and single-crystal potassium bromide substrates. The microstructure and the morphology of the films were characterized by use of optical microscopy, laser scanning microscopy, atomic force microscopy, transmission electron microscopy, micro-Raman spectroscopy, X-ray photoelectron spectroscopy and X-ray diffraction. The results indicated that the deposited material was composed of microcrystalline droplets, typically 3.5 μm in diameter, separated by amorphous-like regions. The droplets were composed of crystalline material at their centers and an outer halo of nanometer-size particles.

Original languageEnglish (US)
Pages (from-to)102-108
Number of pages7
JournalThin Solid Films
Volume339
Issue number1-2
DOIs
StatePublished - 1999

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Keywords

  • Nanostructures
  • Raman scattering
  • Transmission electron microscopy (TEM)
  • X-ray diffraction

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