@inproceedings{ff56dc4cafa4430cbc4b5d71ed9ef34a,
title = "CHARACTERIZATION OF LPCVD ALUMINUM FOR VLSI PROCESSING.",
abstract = "Summary form only given. The properties are discussed of Al films deposited by a low-pressure chemical vapor deposition (LPCVD) process using tri-isobutyl Al (TIBAL) as a source. Results of this work will establish a basic understanding of the properties of these LPCVD Al films and their suitability for current VLSI processing.",
author = "Levy, {R. A.} and L. Green",
year = "1984",
language = "English (US)",
isbn = "4930813085",
series = "Digest of Technical Papers - Symposium on VLSI Technology",
publisher = "Business Cent for Academic Soc Japan",
pages = "32--33",
booktitle = "Digest of Technical Papers - Symposium on VLSI Technology",
}