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Chemical vapor deposition of boron-doped hydrogenated amorphous silicon
F. B. Ellis, A. E. Delahoy
Physics
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peer-review
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Physics & Astronomy
amorphous silicon
100%
boron
93%
vapor deposition
83%
carbon
36%
acetylene
30%
silicon films
29%
open circuit voltage
27%
glow discharges
27%
broadband
19%
silicon
14%
gases
13%