Whereas CVD technology was adopted early by the integrated circuit industry for the deposition of semiconductor and insulator films, CVD metals applications in this industry are only in their infancy. The advantages of CVD metals technology, i. e. , conformal coverage, low temperature and radiation damage-free deposition, selectivity and high purity film formation are discussed in the context of VLSI metallization requirements.
|Original language||English (US)|
|Number of pages||9|
|Journal||Journal of Metals|
|State||Published - Jun 1 1985|
All Science Journal Classification (ASJC) codes