Closed-loop adaptive control for rapid thermal processing

Sergey Belikov, Bernard Friedland

Research output: Contribution to journalConference articlepeer-review

2 Scopus citations

Abstract

An important objective of the feedback control for a rapid thermal processing (RTP) system for a semiconductor wafer is to maintain a uniform temperature of the wafer as it follows a given temperature trajectory. In this paper an adaptive control algorithm is developed using a combination of feedback linearization and a new, nonlinear observer for estimating the exogenous disturbance parameters. The dynamic model, exploiting the circular symmetry of the physical configuration, uses coefficients of a Bessel function expansion as the state variables. An interesting separation property of the control algorithm is proved. A simulation study, using process parameters derived from experimental data obtained from an actual RTP system, gives excellent results.

Original languageEnglish (US)
Pages (from-to)2476-2481
Number of pages6
JournalProceedings of the IEEE Conference on Decision and Control
Volume3
StatePublished - Dec 1 1995
EventProceedings of the 1995 34th IEEE Conference on Decision and Control. Part 1 (of 4) - New Orleans, LA, USA
Duration: Dec 13 1995Dec 15 1995

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Modeling and Simulation
  • Control and Optimization

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