Abstract
An important objective of the feedback control for a rapid thermal processing (RTP) system for a semiconductor wafer is to maintain a uniform temperature of the wafer as it follows a given temperature trajectory. In this paper an adaptive control algorithm is developed using a combination of feedback linearization and a new, nonlinear observer for estimating the exogenous disturbance parameters. The dynamic model, exploiting the circular symmetry of the physical configuration, uses coefficients of a Bessel function expansion as the state variables. An interesting separation property of the control algorithm is proved. A simulation study, using process parameters derived from experimental data obtained from an actual RTP system, gives excellent results.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 2476-2481 |
| Number of pages | 6 |
| Journal | Proceedings of the IEEE Conference on Decision and Control |
| Volume | 3 |
| State | Published - 1995 |
| Event | Proceedings of the 1995 34th IEEE Conference on Decision and Control. Part 1 (of 4) - New Orleans, LA, USA Duration: Dec 13 1995 → Dec 15 1995 |
All Science Journal Classification (ASJC) codes
- Control and Systems Engineering
- Modeling and Simulation
- Control and Optimization