CMOS compatible alignment marks for the SCALPEL proof of lithography tool

R. C. Farrow, W. K. Waskiewicz, I. Kizilyalli, L. Ocola, J. Felker, C. Biddick, G. Gallatin, M. Mkrtchyan, M. Blakey, J. Kraus, A. Novembre, P. Orphanos, M. Peabody, R. Kasica, A. Kornblit, F. Klemens

Research output: Contribution to journalConference articlepeer-review

3 Scopus citations


SCALPEL alignment marks have been fabricated in a SiO2WSi2 structure using SCALPEL lithography and plasma processing. The positions of the marks were detected through e-beam resist in the SCALPEL proof of lithography (SPOL) tool by scanning the image of the corresponding mask mark over the wafer mark and detecting the backscattered electron signal. Single scans of line space patterns yielded mark positions that were repeatable within 30 nm 3σ with a close of 0.4 μC/cm2 and signal-to-noise of 16 dB. An analysis shows that the measured repeatability is consistent with a random noise limited response. The mark detection repeatability limit, that can be attributed to SPOL machine factors, was measured to be 20 nm 3σ. By using a digitally sequenced mark pattern, the capture range of the mark detection was increased to 13 μm while maintaining 36 nm 3σ precision. The SPOL machine mark detection results are very promising considering that they were measured under electron optical conditions that were not optimized.

Original languageEnglish (US)
Pages (from-to)263-266
Number of pages4
JournalMicroelectronic Engineering
Issue number1
StatePublished - May 1999
Externally publishedYes
EventProceedings of the 1998 International Conference on Micro- and Nanofabrication (MNE98) - Leuven
Duration: Sep 22 1998Sep 24 1998

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


Dive into the research topics of 'CMOS compatible alignment marks for the SCALPEL proof of lithography tool'. Together they form a unique fingerprint.

Cite this