CMOS compatible alignment marks for the SCALPEL proof of lithography tool

R. C. Farrow, W. K. Waskiewicz, I. Kizilyalli, L. Ocola, J. Felker, C. Biddick, G. Gallatin, M. Mkrtchyan, M. Blakey, J. Kraus, A. Novembre, P. Orphanos, M. Peabody, R. Kasica, A. Kornblit, F. Klemens

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