CMOS transistor processing compatible with monolithic 3-D integration

Keyphrases

• CMOS Transistor 100%
• Laser Annealing 100%
• Monolithic 3D Integration 100%
• Dopant 66%
• Transistor 66%
• Upper Level 66%
• High Temperature 33%
• Electrical Activation 33%
• Good Quality 33%
• Circuit Structure 33%
• Deposition Process 33%
• 3D IC 33%
• Oxide Deposition 33%
• Low-temperature Oxides 33%
• Dopant Activation 33%
• Heating Material 33%
• Conventional CMOS 33%
• CMOS Process 33%
• Three-Dimensional ICs 33%
• Gate Oxidation 33%
• Temperature Steps 33%

Engineering

• Dopants 100%
• Low-Temperature 50%
• Early Work 50%
• Deposition Process 50%
• Three Dimensional Integrated Circuits 50%
• Dopant Activation 50%

Material Science

• Transistor 100%
• Doping (Additives) 75%
• Electronic Circuit 25%
• Oxide Compound 25%
• Oxidation Reaction 25%