Commercialization of SCALPEL masks

R. C. Farrow, A. E. Novembre, M. Peabody, R. Kasica, M. Blakey, J. A. Liddle, K. Werter, R. DeMarco, L. Ocola, L. Rutberg, T. Saunders, J. Unruh, F. Qian, M. Smith

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

To investigate the viability of large scale manufacture of SCALPEL masks, key component of the SCALPEL mask process have been performed by commercial supplier. SCALPEL mask blanks have been fabricated by MCNC to specification supplied by Lucent and have been delivered, patterned, and utilized. Pattering, inspection, and metrology have been performed by Dupont Photomask and Photomask and Photronics using the standard set of tool used for photomask. A wet chemical pattern transfer process has been developed that is compatible with the processing tools in the mask shop and is extensible to the 0.1 μm generation of integrated circuits. SCALPEL mask that have been fabricated using these processing and tools exhibit excellent pattern fidlity and feature edge quality.

Original languageEnglish (US)
Pages (from-to)3582-3586
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume16
Issue number6
DOIs
StatePublished - Jan 1 1998

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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