Commercialization of SCALPEL masks

R. C. Farrow; A. E. Novembre; M. Peabody; R. Kasica; M. Blakey; J. A. Liddle; K. Werter; R. DeMarco; L. Ocola; L. Rutberg; T. Saunders; J. Unruh; F. Qian; M. Smith

doi:10.1116/1.590310

Commercialization of SCALPEL masks

R. C. Farrow, A. E. Novembre, M. Peabody, R. Kasica, M. Blakey, J. A. Liddle, K. Werter, R. DeMarco, L. Ocola, L. Rutberg, T. Saunders, J. Unruh, F. Qian, M. Smith

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

To investigate the viability of large scale manufacture of SCALPEL masks, key component of the SCALPEL mask process have been performed by commercial supplier. SCALPEL mask blanks have been fabricated by MCNC to specification supplied by Lucent and have been delivered, patterned, and utilized. Pattering, inspection, and metrology have been performed by Dupont Photomask and Photomask and Photronics using the standard set of tool used for photomask. A wet chemical pattern transfer process has been developed that is compatible with the processing tools in the mask shop and is extensible to the 0.1 μm generation of integrated circuits. SCALPEL mask that have been fabricated using these processing and tools exhibit excellent pattern fidlity and feature edge quality.

Original language	English (US)
Pages (from-to)	3582-3586
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	16
Issue number	6
DOIs	https://doi.org/10.1116/1.590310
State	Published - 1998
Externally published	Yes

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.590310

Cite this

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title = "Commercialization of SCALPEL masks",

abstract = "To investigate the viability of large scale manufacture of SCALPEL masks, key component of the SCALPEL mask process have been performed by commercial supplier. SCALPEL mask blanks have been fabricated by MCNC to specification supplied by Lucent and have been delivered, patterned, and utilized. Pattering, inspection, and metrology have been performed by Dupont Photomask and Photomask and Photronics using the standard set of tool used for photomask. A wet chemical pattern transfer process has been developed that is compatible with the processing tools in the mask shop and is extensible to the 0.1 μm generation of integrated circuits. SCALPEL mask that have been fabricated using these processing and tools exhibit excellent pattern fidlity and feature edge quality.",

author = "Farrow, {R. C.} and Novembre, {A. E.} and M. Peabody and R. Kasica and M. Blakey and Liddle, {J. A.} and K. Werter and R. DeMarco and L. Ocola and L. Rutberg and T. Saunders and J. Unruh and F. Qian and M. Smith",

year = "1998",

doi = "10.1116/1.590310",

language = "English (US)",

volume = "16",

pages = "3582--3586",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

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TY - JOUR

T1 - Commercialization of SCALPEL masks

AU - Farrow, R. C.

AU - Novembre, A. E.

AU - Peabody, M.

AU - Kasica, R.

AU - Blakey, M.

AU - Liddle, J. A.

AU - Werter, K.

AU - DeMarco, R.

AU - Ocola, L.

AU - Rutberg, L.

AU - Saunders, T.

AU - Unruh, J.

AU - Qian, F.

AU - Smith, M.

PY - 1998

Y1 - 1998

N2 - To investigate the viability of large scale manufacture of SCALPEL masks, key component of the SCALPEL mask process have been performed by commercial supplier. SCALPEL mask blanks have been fabricated by MCNC to specification supplied by Lucent and have been delivered, patterned, and utilized. Pattering, inspection, and metrology have been performed by Dupont Photomask and Photomask and Photronics using the standard set of tool used for photomask. A wet chemical pattern transfer process has been developed that is compatible with the processing tools in the mask shop and is extensible to the 0.1 μm generation of integrated circuits. SCALPEL mask that have been fabricated using these processing and tools exhibit excellent pattern fidlity and feature edge quality.

AB - To investigate the viability of large scale manufacture of SCALPEL masks, key component of the SCALPEL mask process have been performed by commercial supplier. SCALPEL mask blanks have been fabricated by MCNC to specification supplied by Lucent and have been delivered, patterned, and utilized. Pattering, inspection, and metrology have been performed by Dupont Photomask and Photomask and Photronics using the standard set of tool used for photomask. A wet chemical pattern transfer process has been developed that is compatible with the processing tools in the mask shop and is extensible to the 0.1 μm generation of integrated circuits. SCALPEL mask that have been fabricated using these processing and tools exhibit excellent pattern fidlity and feature edge quality.

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JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

ER -

Commercialization of SCALPEL masks

Abstract

All Science Journal Classification (ASJC) codes

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