Controlled Nucleation of Silicon Nanocrystals on a Periodic Template

Christopher C. Striemer, Rishikesh Krishnan, Philippe M. Fauchet, Leonid Tsybeskov, Qianghua Xie

Research output: Contribution to journalArticlepeer-review

14 Scopus citations

Abstract

This paper presents a successful unification of standard lithographic approaches (top down), anisotropic etching of atomically smooth surfaces, and controlled crystallization of silicon quantum dots (bottom up) to produce silicon nanoclusters at desired locations. These results, in combination with our previous demonstration of Si nanocrystal uniformity in size, shape, and crystallographic orientation, show strong potential for the application of silicon nanocrystals in electronic devices.

Original languageEnglish (US)
Pages (from-to)643-646
Number of pages4
JournalNano Letters
Volume1
Issue number11
DOIs
StatePublished - Nov 1 2001
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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