TY - JOUR
T1 - Design and simulation of T-gate AlN/β-Ga2O3 HEMT for DC, RF and high-power nanoelectronics switching applications
AU - Singh, Rajan
AU - Rao, G. Purnachandra
AU - Lenka, Trupti Ranjan
AU - Prasad, S. V.S.
AU - Boukortt, Nour El I.
AU - Crupi, Giovanni
AU - Nguyen, Hieu Pham Trung
N1 - Publisher Copyright:
© 2023 John Wiley & Sons Ltd.
PY - 2024/1/1
Y1 - 2024/1/1
N2 - In this paper, we report DC and RF analysis of a T-gate AlN/β-Ga2O3 high electron mobility transistors (HEMTs) by optimizing the gate-drain distance (LGD) and two T-gate dimensions given by the—head-length (LHL) and the foot-length (LFL). A two-dimensional (2-D) physics-based device simulator attuned with experimental results is used to perform the analysis. The AlN/β-Ga2O3 HEMT achieves a high two-dimensional electron gas (2DEG) density of ~3 × 1013 cm−2, which is attributed to large spontaneous as well as piezoelectric polarization components of the 10 nm AlN thick barrier layer. 2DEG density is also numerically validated using widely used polarization model for III nitrides. It is demonstrated that a highly scaled, both lateral and vertical, device with optimized T-gate dimensions achieves higher blocking voltage (VBR), low on-resistance (RON), higher cut-off frequency (fT) and higher maximum oscillation frequency (fMAX), simultaneously. Consequently, AlN/β-Ga2O3 HEMT achieves a low specific-on resistance (RON,sp) of 0.1 mΩ cm2 and an off-state breakdown voltage of 904 V, which corresponds to the record power figure-of-merit (PFoM) of ~8172 MW/cm2. Furthermore, fT of 73 GHz and fMAX of 142 GHz are estimated. These results—low power conduction loss along with higher blocking voltage, and superior RF parameters show the potential of the analyzed device T-gate AlN/β-Ga2O3 HEMT for high-power switching and RF applications.
AB - In this paper, we report DC and RF analysis of a T-gate AlN/β-Ga2O3 high electron mobility transistors (HEMTs) by optimizing the gate-drain distance (LGD) and two T-gate dimensions given by the—head-length (LHL) and the foot-length (LFL). A two-dimensional (2-D) physics-based device simulator attuned with experimental results is used to perform the analysis. The AlN/β-Ga2O3 HEMT achieves a high two-dimensional electron gas (2DEG) density of ~3 × 1013 cm−2, which is attributed to large spontaneous as well as piezoelectric polarization components of the 10 nm AlN thick barrier layer. 2DEG density is also numerically validated using widely used polarization model for III nitrides. It is demonstrated that a highly scaled, both lateral and vertical, device with optimized T-gate dimensions achieves higher blocking voltage (VBR), low on-resistance (RON), higher cut-off frequency (fT) and higher maximum oscillation frequency (fMAX), simultaneously. Consequently, AlN/β-Ga2O3 HEMT achieves a low specific-on resistance (RON,sp) of 0.1 mΩ cm2 and an off-state breakdown voltage of 904 V, which corresponds to the record power figure-of-merit (PFoM) of ~8172 MW/cm2. Furthermore, fT of 73 GHz and fMAX of 142 GHz are estimated. These results—low power conduction loss along with higher blocking voltage, and superior RF parameters show the potential of the analyzed device T-gate AlN/β-Ga2O3 HEMT for high-power switching and RF applications.
KW - HEMT
KW - III-nitrides
KW - T-gate
KW - nanoelectronics
KW - switching
KW - β-GaO
UR - http://www.scopus.com/inward/record.url?scp=85164151154&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85164151154&partnerID=8YFLogxK
U2 - 10.1002/jnm.3146
DO - 10.1002/jnm.3146
M3 - Article
AN - SCOPUS:85164151154
SN - 0894-3370
VL - 37
JO - International Journal of Numerical Modelling: Electronic Networks, Devices and Fields
JF - International Journal of Numerical Modelling: Electronic Networks, Devices and Fields
IS - 1
M1 - e3146
ER -