Design of an ultralow coverage metal evaporator based on a geometric factor

K. K. Chin, P. McKernan, I. Lindau

Research output: Contribution to journalLetterpeer-review

8 Scopus citations

Abstract

An ultralow coverage eight-metal evaporator has been designed, built, tested, and put into use. Based on a geometric factor of 1:200, a metal coverage as low as 10–4 monolayer is reproducibly obtained with an error in coverage less than 20%. Various considerations during the design of the evaporator are discussed.

Original languageEnglish (US)
Pages (from-to)1949-1951
Number of pages3
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume4
Issue number4
DOIs
StatePublished - Jan 1 1986
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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