Effect of Current Density Ramping on the Growth Rate and Structure of AA2024-T3

Peter Totaro, Boris Khusid

Research output: Contribution to journalArticlepeer-review

1 Scopus citations


The presented study successfully demonstrated advantages of multistep anodization of AA2024—T3. Coating properties and morphology were studied in detail for five anodization pro-cesses: a conventional Base process with a constant applied current density and processes with current density applied in one (OS1 and OS2) and five (MS1 and MS2) steps at different magnitudes during the ramp period. Due to lower oxygen infusion, processes MS1 and MS2 produced a more intact coating with reduced porosity and enhanced abrasion resistance and hardness. The presented results clearly demonstrate that starting anodization at a low voltage and then slowly ramping current density will form coatings with a higher aluminum/oxygen ratio and enhanced properties over a shorter period of processing.

Original languageEnglish (US)
Article number3258
Issue number9
StatePublished - May 1 2022

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • Condensed Matter Physics


  • aerospace aluminum-copper alloys
  • anodizing
  • current density
  • intermetallics
  • ramping


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