Effect of Ion-beam bombardment on microstructural and magnetic properties of Ni80Fe20/α-Fe2O3 thin films

Chao Zheng, Tien Chi Lan, Chin Shueh, Ryan D. Desautels, Johan Van Lierop, Ko Wei Lin, Philip W.T. Pong

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5 Scopus citations


Ion-beam bombardment has been established as an effective way to tune the microstructure and thus modify the magnetic anisotropy of thin film materials, leading to certain remarkable magnetic properties. In this work, we investigated a Ni80Fe20/α-Fe2O3 bilayer deposited with a dual ionbeam deposition technique. Low-energy argon ion-beam bombardment during the α-Fe2O3 deposition led to a decline of crystallinity and interfacial roughness of the bilayer, whereas the grain size distribution remained essentially unchanged. At low temperature, the coercivity exhibited a pronounced decrease after the bombardment, indicating that the effective uniaxial anisotropy in the ferromagnetic layer was dramatically reduced. Such reduction in uniaxial anisotropy was likely attributed to the irreversible transition in the α-Fe2O 3 grains caused by the ion-beam bombardment, which subsequently modified the anisotropy in the Ni80Fe20 layer. The bombarded bilayer also exhibited a larger ΔMFC-ZFC compared to the unbombarded bilayer, which indicated a stronger exchange coupling between the ferromagnetic layer and the antiferromagnetic layer.

Original languageEnglish (US)
Article number06JB03
JournalJapanese Journal of Applied Physics
Issue number6 SPEC. ISSUE
StatePublished - Jun 2014
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • General Engineering
  • General Physics and Astronomy


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