Effect of post plasma oxidation on Ge gate stacks interface formation

S. Mukhopadhyay, S. Mitra, Y. M. Ding, K. L. Ganapathi, D. Misra, N. Bhat, K. Tapily, R. D. Clark, S. Consiglio, C. S. Wajda, G. J. Leusink

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Scopus citations

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Engineering & Materials Science