Effects of different substrates and CdCl₂ treatment on the properties of CdS thin films deposited by magnetron sputtering

Keyphrases

• Magnetron Sputtering 100%
• Annealing 100%
• Substrate Treatment 100%
• CdS Thin Films 100%
• Cd Treatment 100%
• CdS Films 62%
• As-deposited 50%
• Glass Substrate 37%
• Substrate Type 25%
• ITO Substrate 25%
• AZO Substrate 25%
• FTO Gene 25%
• Optical Properties 12%
• State Change 12%
• Band Gap 12%
• Visible Spectrum 12%
• Structure-property Relationships 12%
• Morphological Properties 12%
• Spectral Analysis 12%
• Morphological Structure 12%
• Field Emission Scanning Electron Microscopy (FE-SEM) 12%
• Grain Size 12%
• Diffraction Pattern 12%
• Surface Roughness 12%
• Thermal Annealing 12%
• Doping Concentration 12%
• Cadmium Chloride 12%
• Dry Air 12%
• Visible Light Transmittance 12%
• Band Tail States 12%
• Diffraction Peak 12%
• Highly Oriented 12%
• Preferential Orientation 12%
• Annealing Process 12%
• RF Magnetron Sputtering 12%
• Optical Absorption Coefficient 12%
• Hexagonal Phase 12%
• Mixed-phase Structure 12%
• UV-Vis Spectrophotometer 12%
• Grain Surface 12%
• XRD Diffraction 12%
• Average Transmittance 12%
• Cubic Phase 12%

Material Science

• Film 100%
• Thin Films 100%
• Magnetron Sputtering 100%
• Annealing 60%
• Indium Tin Oxide 60%
• Optical Property 20%
• Scanning Electron Microscopy 20%
• Phase Structure 20%
• X-Ray Diffraction 20%
• Grain Size 20%
• Diffraction Pattern 20%
• Surface Roughness 20%

Engineering

• Thin Films 100%
• Magnetron 100%
• Field Emission Scanning Electron Microscope 20%
• Absorption Coefficient 20%
• Glass Substrate 20%
• Energy Gap 20%
• Dry Air 20%
• Band Tail 20%
• Annealing Process 20%
• Mixed Phase 20%
• Phase Structure 20%