Effects of seeding methods on the fabrication of microcrystalline silicon solar cells using radio frequency plasma enhanced chemical vapor deposition

Yuan Min Li, Liwei Li, J. A.Anna Selvan, Alan E. Delahoy, Roland A. Levy

Research output: Contribution to journalArticlepeer-review

17 Scopus citations

Abstract

Single junction p-i-n μc-Si:H solar cells were prepared in a low-cost, large-area single chamber radio frequency plasma enhanced chemical vapor deposition system. The effects of seeding processes on the growth of μc-Si:H i-layers and performance of μc-Si:H solar cells were investigated. Seeding processes, usually featured by highly hydrogen rich plasma, are effective in inducing the growth of μc-Si:H i-layers. It has been demonstrated that p-layer seeding methods are preferable to i-layer seeding. While performance of μc-Si:H solar cells produced by i-layer seeding methods was usually limited by very low fill factors, μc-Si:H solar cells with good initial and stabilized conversion efficiencies were obtained by p-layer seeding.

Original languageEnglish (US)
Pages (from-to)84-88
Number of pages5
JournalThin Solid Films
Volume483
Issue number1-2
DOIs
StatePublished - Jul 1 2005

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Keywords

  • Chemical vapor deposition
  • Nucleation
  • Silicon
  • Solar cells

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