Effects of substrate temperature and RF power on the formation of aligned nanorods in ZnO thin films

Sudhakar Shet, Kwang Soon Ahn, N. Ravindra, Yanfa Yan, John Turner, Mowafak Al-Jassim

Research output: Contribution to journalArticlepeer-review

27 Scopus citations

Abstract

We report on the effects of substrate temperature and RF power on the formation of aligned nanorod-like morphology in ZnO thin films. ZnO thin films were sputter-deposited in mixed Ar and N 2 gas ambient at various substrate temperatures and RF powers. We find that the substrate temperature plays more important role than RF power in the formation of ZnO nanorod-like morphology. At low substrate temperatures (below 300°nO nanorod-like morphology does not form regardless of RF powers. High RF power helps to promote the formation of aligned ZnO nanorod-like morphology. However, lower RF powers usually lead to ZnO films with better crystallinity at the same substrate temperatures in mixed Ar and N 2 gas ambient and therefore better photoelectrochemical response.

Original languageEnglish (US)
Pages (from-to)25-30
Number of pages6
JournalJOM
Volume62
Issue number6
DOIs
StatePublished - Jun 1 2010

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Engineering(all)

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