Effects of substrate temperature and RF power on the formation of aligned nanorods in ZnO thin films

Sudhakar Shet, Kwang Soon Ahn, Ravindra Nuggehalli, Yanfa Yan, John Turner, Mowafak Al-Jassim

Research output: Contribution to journalArticlepeer-review

27 Scopus citations

Abstract

We report on the effects of substrate temperature and RF power on the formation of aligned nanorod-like morphology in ZnO thin films. ZnO thin films were sputter-deposited in mixed Ar and N2 gas ambient at various substrate temperatures and RF powers. We find that the substrate temperature plays more important role than RF power in the formation of ZnO nanorod-like morphology. At low substrate temperatures (below 300°nO nanorod-like morphology does not form regardless of RF powers. High RF power helps to promote the formation of aligned ZnO nanorod-like morphology. However, lower RF powers usually lead to ZnO films with better crystallinity at the same substrate temperatures in mixed Ar and N2 gas ambient and therefore better photoelectrochemical response.

Original languageEnglish (US)
Pages (from-to)25-30
Number of pages6
JournalJOM
Volume62
Issue number6
DOIs
StatePublished - Jun 2010

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • General Engineering

Fingerprint

Dive into the research topics of 'Effects of substrate temperature and RF power on the formation of aligned nanorods in ZnO thin films'. Together they form a unique fingerprint.

Cite this