Keyphrases
Electrical Characterization
100%
Interface Layer
100%
Oxide Removal
100%
Chemical Oxide
100%
Atomic Layer Deposition
75%
Flat-band Voltage
50%
Low Temperature
25%
Antenna
25%
Room Temperature
25%
Oxides
25%
P-type
25%
Gate Stack
25%
Aluminum Oxide
25%
Temperature Measurement
25%
Plasma Oxidation
25%
Zirconium Dioxide
25%
TiN Gate
25%
Low Temperature Measurements
25%
Surface Potential
25%
Capacitance-voltage
25%
Capacitance-voltage Measurements
25%
Equivalent Oxide Thickness
25%
Interface Treatment
25%
Deep Level Transient Spectroscopy
25%
O3 Treatment
25%
Plasma Chemical
25%
Chemical Oxidation
25%
Gate Voltage
25%
Bulk Doping
25%
Conductance-voltage
25%
Processed Samples
25%
Voltage Measurement
25%
300 Mm Wafer
25%
Engineering
Atomic Layer Deposition
100%
Interface Layer
100%
Low-Temperature
66%
Antenna
33%
Room Temperature
33%
Transients
33%
Chemical Treatment
33%
Gate Stack
33%
Deep Level
33%
Surface Potential
33%
Oxide Thickness
33%
Gate Voltage
33%
Chemical Oxidation
33%
Physics
Atomic Layer Epitaxy
100%
Antenna
33%
Transients
33%
Room Temperature
33%
Chemical Treatment
33%
Material Science
Oxide Compound
100%
Capacitance
33%
Oxidation Reaction
33%
Zirconia
16%
Al2O3
16%
Deep-Level Transient Spectroscopy
16%