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Electrical degradation of AI/TiW/CoSi
2
shallow junctions
S. A. Eshraghi
, G. E. Georgiou
, R. Uu
, R. C. Beairsto
, K. P. Cheung
Research output
:
Contribution to journal
›
Article
›
peer-review
4
Scopus citations
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2
shallow junctions'. Together they form a unique fingerprint.
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Keyphrases
Auger Analysis
50%
Barrier Failure
50%
Barrier Properties
50%
CoSi2
100%
Diffusion Barrier
50%
Electrical Data
100%
Electrical Degradation
100%
Electrical Test
50%
Rutherford Backscattering
50%
Shallow Junction
100%
Si Structures
50%
Engineering
Artificial Intelligence
100%
Barrier Property
50%
Data Show
50%
Diffusion Barrier
50%
Shallow Junction
100%
Shallower
50%
Material Science
Film
100%
Physics
Backscattering
100%