Estimation of emissivity of a wafer in an RTP chamber by a dynamic observer

Sergey Belikov; David Hur; Bernard Friedland; N. M. Ravindra

doi:10.1557/proc-429-335

Estimation of emissivity of a wafer in an RTP chamber by a dynamic observer

Sergey Belikov
, David Hur
, Bernard Friedland
, N. M. Ravindra

Research output: Contribution to journal › Conference article › peer-review

Abstract

A method of estimation of wavelength-dependent emissivity of silicon wafers using thermocouple measurements is presented here. A dynamic observer and a persistent excitation of the lamps are required for convergence of the observer's estimates to the actual values of parameters for emissivity approximation. A TI designed RTP equipment and adaptive close-loop temperature control have been used to generate the required persistent excitation. Theory of emissivity estimation by this method has been developed and illustrated by experiment with this 3-zone RTP system.

Original language	English (US)
Pages (from-to)	335-340
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	429
DOIs	https://doi.org/10.1557/proc-429-335
State	Published - 1996
Event	Proceedings of the 1996 MRS Spring Symposium - San Francisco, CA, USA Duration: Apr 8 1996 → Apr 12 1996

All Science Journal Classification (ASJC) codes

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1557/proc-429-335

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@article{fb69a8eeebc640e89265e2d1d12834e2,

title = "Estimation of emissivity of a wafer in an RTP chamber by a dynamic observer",

abstract = "A method of estimation of wavelength-dependent emissivity of silicon wafers using thermocouple measurements is presented here. A dynamic observer and a persistent excitation of the lamps are required for convergence of the observer's estimates to the actual values of parameters for emissivity approximation. A TI designed RTP equipment and adaptive close-loop temperature control have been used to generate the required persistent excitation. Theory of emissivity estimation by this method has been developed and illustrated by experiment with this 3-zone RTP system.",

author = "Sergey Belikov and David Hur and Bernard Friedland and Ravindra, \{N. M.\}",

year = "1996",

doi = "10.1557/proc-429-335",

language = "English (US)",

volume = "429",

pages = "335--340",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "Proceedings of the 1996 MRS Spring Symposium ; Conference date: 08-04-1996 Through 12-04-1996",

}

TY - JOUR

T1 - Estimation of emissivity of a wafer in an RTP chamber by a dynamic observer

AU - Belikov, Sergey

AU - Hur, David

AU - Friedland, Bernard

AU - Ravindra, N. M.

PY - 1996

Y1 - 1996

N2 - A method of estimation of wavelength-dependent emissivity of silicon wafers using thermocouple measurements is presented here. A dynamic observer and a persistent excitation of the lamps are required for convergence of the observer's estimates to the actual values of parameters for emissivity approximation. A TI designed RTP equipment and adaptive close-loop temperature control have been used to generate the required persistent excitation. Theory of emissivity estimation by this method has been developed and illustrated by experiment with this 3-zone RTP system.

AB - A method of estimation of wavelength-dependent emissivity of silicon wafers using thermocouple measurements is presented here. A dynamic observer and a persistent excitation of the lamps are required for convergence of the observer's estimates to the actual values of parameters for emissivity approximation. A TI designed RTP equipment and adaptive close-loop temperature control have been used to generate the required persistent excitation. Theory of emissivity estimation by this method has been developed and illustrated by experiment with this 3-zone RTP system.

UR - https://www.scopus.com/pages/publications/0030381004

UR - https://www.scopus.com/pages/publications/0030381004#tab=citedBy

U2 - 10.1557/proc-429-335

DO - 10.1557/proc-429-335

M3 - Conference article

AN - SCOPUS:0030381004

SN - 0272-9172

VL - 429

SP - 335

EP - 340

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Proceedings of the 1996 MRS Spring Symposium

Y2 - 8 April 1996 through 12 April 1996

ER -

Estimation of emissivity of a wafer in an RTP chamber by a dynamic observer

Abstract

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