Keyphrases
Long-term Reliability
100%
Passivation
100%
InGaAs
100%
InP HBT
100%
Junction Device
100%
Gap Filling
75%
Base Metals
50%
Adhesion Properties
50%
Spinon
50%
Graded Junction
50%
In-device Passivation
50%
Gain Degradation
50%
Adhesion
25%
Long-term Stability
25%
Electrical Characteristics
25%
Polyimide
25%
Silica
25%
Mesostructure
25%
Metal Surface
25%
InGaAsP
25%
Plasma Exposure
25%
Fmax
25%
DC Characteristics
25%
Common Emitter Current Gain
25%
Self-aligned
25%
SiNx
25%
Semiconductor Surface
25%
Cured Films
25%
Electron Cyclotron Resonance
25%
Device Encapsulation
25%
Double Heterojunction Bipolar Transistor
25%
Encapsulation Techniques
25%
Benzocyclobutene
25%
Transistor Structure
25%
Polyimide Film
25%
Base Region
25%
Plasma-enhanced Chemical Vapor
25%
Engineering
Passivation
100%
Indium Gallium Arsenide
100%
Base Metal
66%
Heterojunctions
33%
Chemical Vapor Deposition
33%
Great Deal
33%
Current Gain
33%
Bipolar Transistor
33%
Cyclotron Resonance
33%
Base Region
33%
Material Science
Film
100%
Indium Gallium Arsenide
100%
Polyimide
66%
Heterojunction
33%
Metal Surface
33%
Chemical Vapor Deposition
33%
Bipolar Transistor
33%
Electrical Property
33%