Evaluation of LPCVD boron nitride as a low dielectric constant material

Keyphrases

• Low Pressure Chemical Vapor Deposition (LPCVD) 100%
• Boron Nitride 100%
• Low Dielectric Constant Materials 100%
• Low Pressure 50%
• Chemical Properties 50%
• Temperature Range 50%
• Deposition Conditions 50%
• Stoichiometry 50%
• Structural Mechanical Properties 50%
• Processing Conditions 50%
• Low Dielectric Constant 50%
• Dielectric Constant 50%
• Borane Complexes 50%
• Triethylamine Borane 50%
• Flow Rate Ratio 50%
• Carbon Content 50%
• Interlevel Dielectrics 50%
• Dielectric Applications 50%
• Film Composition 50%
• Structural & Optical Properties 50%

Material Science

• Film 100%
• Permittivity 100%
• Low Pressure Chemical Vapor Deposition 100%
• Boron Nitride 100%
• Optical Property 25%
• Dielectric Material 25%
• Chemical Property 25%