Exchange bias study of CoFeB/IrMn antidot and nanodot arrays fabricated by nanosphere lithography

X. Li, C. W. Leung, K. W. Lin, M. S. Chan, P. W.T. Pong

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Exchange bias effect in nanostructures are widely investigated for applications in nanometric spintronic sensors. In this work, nanosphere lithography was adopted to pattern CoFeB/IrMn antidot and nanodot arrays. The exchange bias and coercivity of the nanostructures and continuous films exhibit similar exponential dependence on CoFeB layer thickness. High temperature annealing results in decreased exchange bias and coercivity. This work provides physical insights on magnetization reversal response in nanosized spintronic devices.

Original languageEnglish (US)
Title of host publication2016 5th International Symposium on Next-Generation Electronics, ISNE 2016
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781509024391
DOIs
StatePublished - Aug 12 2016
Externally publishedYes
Event5th International Symposium on Next-Generation Electronics, ISNE 2016 - Hsinchu, Taiwan, Province of China
Duration: May 4 2016May 6 2016

Publication series

Name2016 5th International Symposium on Next-Generation Electronics, ISNE 2016

Conference

Conference5th International Symposium on Next-Generation Electronics, ISNE 2016
Country/TerritoryTaiwan, Province of China
CityHsinchu
Period5/4/165/6/16

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

Keywords

  • exchange bias
  • nanosphere lithography
  • nanostructures

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