Fabrication and commercialization of SCALPEL masks

A. E. Novembre; M. L. Peabody; M. I. Blakey; R. C. Farrow; R. J. Kasica; J. A. Liddle; T. Saunders; D. M. Tennant

doi:10.1117/12.328847

Fabrication and commercialization of SCALPEL masks

A. E. Novembre, M. L. Peabody, M. I. Blakey, R. C. Farrow, R. J. Kasica, J. A. Liddle, T. Saunders, D. M. Tennant

Research output: Contribution to journal › Conference article › peer-review

8 Scopus citations

Abstract

Scattering with angular limitation in projection electron lithography (SCALPEL) masks was fabricated for use in the Proof-of-Lithography system and to demonstrate the feasibility of having them produced by a commercial blank manufacturer and optical mask shops. As such, mask blanks were formed from 100 mm diameter (100) silicon wafers. The mask was supported by an underlying network of struts which were arranged to be compatible with the step and scan writing strategy of the exposure tool and to provide robustness to the mask.

Original language	English (US)
Pages (from-to)	350-357
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3412
DOIs	https://doi.org/10.1117/12.328847
State	Published - 1998
Externally published	Yes
Event	Photomask and X-Ray Mask Technology V - Kawasaki, Japan Duration: Apr 9 1998 → Apr 10 1998

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Applied Mathematics
Electrical and Electronic Engineering
Computer Science Applications

Keywords

CD metrology
Defect inspection
Electron-beam lithography

Access to Document

10.1117/12.328847

Cite this

@article{04327fcf839a4d0d8fc4094a4395c9e2,

title = "Fabrication and commercialization of SCALPEL masks",

abstract = "Scattering with angular limitation in projection electron lithography (SCALPEL) masks was fabricated for use in the Proof-of-Lithography system and to demonstrate the feasibility of having them produced by a commercial blank manufacturer and optical mask shops. As such, mask blanks were formed from 100 mm diameter (100) silicon wafers. The mask was supported by an underlying network of struts which were arranged to be compatible with the step and scan writing strategy of the exposure tool and to provide robustness to the mask.",

keywords = "CD metrology, Defect inspection, Electron-beam lithography",

author = "Novembre, {A. E.} and Peabody, {M. L.} and Blakey, {M. I.} and Farrow, {R. C.} and Kasica, {R. J.} and Liddle, {J. A.} and T. Saunders and Tennant, {D. M.}",

year = "1998",

doi = "10.1117/12.328847",

language = "English (US)",

volume = "3412",

pages = "350--357",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Photomask and X-Ray Mask Technology V ; Conference date: 09-04-1998 Through 10-04-1998",

}

TY - JOUR

T1 - Fabrication and commercialization of SCALPEL masks

AU - Novembre, A. E.

AU - Peabody, M. L.

AU - Blakey, M. I.

AU - Farrow, R. C.

AU - Kasica, R. J.

AU - Liddle, J. A.

AU - Saunders, T.

AU - Tennant, D. M.

PY - 1998

Y1 - 1998

N2 - Scattering with angular limitation in projection electron lithography (SCALPEL) masks was fabricated for use in the Proof-of-Lithography system and to demonstrate the feasibility of having them produced by a commercial blank manufacturer and optical mask shops. As such, mask blanks were formed from 100 mm diameter (100) silicon wafers. The mask was supported by an underlying network of struts which were arranged to be compatible with the step and scan writing strategy of the exposure tool and to provide robustness to the mask.

AB - Scattering with angular limitation in projection electron lithography (SCALPEL) masks was fabricated for use in the Proof-of-Lithography system and to demonstrate the feasibility of having them produced by a commercial blank manufacturer and optical mask shops. As such, mask blanks were formed from 100 mm diameter (100) silicon wafers. The mask was supported by an underlying network of struts which were arranged to be compatible with the step and scan writing strategy of the exposure tool and to provide robustness to the mask.

KW - CD metrology

KW - Defect inspection

KW - Electron-beam lithography

UR - http://www.scopus.com/inward/record.url?scp=0004548773&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0004548773&partnerID=8YFLogxK

U2 - 10.1117/12.328847

DO - 10.1117/12.328847

M3 - Conference article

AN - SCOPUS:0004548773

SN - 0277-786X

VL - 3412

SP - 350

EP - 357

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Photomask and X-Ray Mask Technology V

Y2 - 9 April 1998 through 10 April 1998

ER -

Fabrication and commercialization of SCALPEL masks

Abstract

All Science Journal Classification (ASJC) codes

Keywords

Access to Document

Other files and links

Fingerprint

Cite this