Fabrication and commercialization of SCALPEL masks

A. E. Novembre, M. L. Peabody, M. I. Blakey, R. C. Farrow, R. J. Kasica, J. A. Liddle, T. Saunders, D. M. Tennant

Research output: Contribution to journalConference articlepeer-review

8 Scopus citations


Scattering with angular limitation in projection electron lithography (SCALPEL) masks was fabricated for use in the Proof-of-Lithography system and to demonstrate the feasibility of having them produced by a commercial blank manufacturer and optical mask shops. As such, mask blanks were formed from 100 mm diameter (100) silicon wafers. The mask was supported by an underlying network of struts which were arranged to be compatible with the step and scan writing strategy of the exposure tool and to provide robustness to the mask.

Original languageEnglish (US)
Pages (from-to)350-357
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - 1998
Externally publishedYes
EventPhotomask and X-Ray Mask Technology V - Kawasaki, Japan
Duration: Apr 9 1998Apr 10 1998

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Applied Mathematics
  • Electrical and Electronic Engineering
  • Computer Science Applications


  • CD metrology
  • Defect inspection
  • Electron-beam lithography


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