Fabrication of spintronic devices - Etching endpoint detection by resistance measurement for magnetic tunnel junctions

Philip W.T. Pong, Moshe Schmoueli, William F. Egelhoff

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations


Magnetic tunnel junctions (MTJs) have received tremendous interest since the discovery of substantial room temperature tunneling magnetoresistance (TMR) due to spin-dependent tunneling, and have been intensively investigated for applications in next-generation memory devices, hard disk drives, and magnetic sensors. In the fabrication of MTJs, etching is needed to remove the top cap layers, upper magnetic layers, and the middle oxide layer in order to form a tunneling junction. In view of this, we have devised an innovative, simple, low-cost endpoint detection method for fabricating MTJs. In this method, the endpoint is detected by measurement of the sheet resistance of the MTJ stack. Only a multimeter is needed in this method, hence it provides a simple low-cost alternative for spintronic device researchers to explore the research field of magnetic tunnel junctions. This technique is also of great use in other kinds of metallic stack etching experiments.

Original languageEnglish (US)
Title of host publicationNanoengineering
Subtitle of host publicationFabrication, Properties, Optics, and Devices IV
StatePublished - 2007
Externally publishedYes
EventNanoengineering: Fabrication, Properties, Optics, and Devices IV - San Diego, CA, United States
Duration: Aug 27 2007Aug 30 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


ConferenceNanoengineering: Fabrication, Properties, Optics, and Devices IV
Country/TerritoryUnited States
CitySan Diego, CA

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


  • Endpoint detection
  • Fabrication
  • Magnetic tunnel junction
  • Spintronics
  • Tunneling magnetoresistance


Dive into the research topics of 'Fabrication of spintronic devices - Etching endpoint detection by resistance measurement for magnetic tunnel junctions'. Together they form a unique fingerprint.

Cite this