@inproceedings{cd518d3580144017af1bda679bdb48d1,
title = "Fabrication strategies for magnetic tunnel junctions with magnetoelectronic applications",
abstract = "In this paper, two lithographic fabrication processes for magnetic tunnel junctions (MTJs) with different mask designs and etching technologies are discussed. The advantages and disadvantages of both processes are compared. The crucial steps to protect the oxide insulating barriers and avoid side-wall redepositions (which may lead to short circuits) are developed, and important design considerations of the mask patterns and the device geometric structures are elaborated. We show that implementing the strategies developed greatly increases the successful manufacturing yield of MTJ magnetoelectronics devices.",
keywords = "Etching, Ion milling, Lift-off resist, Lithography, Magnetic tunnel junction, Mask, Tunneling magnetoresistance",
author = "Pong, {Philip W.T.} and Egelhoff, {William F.}",
year = "2007",
doi = "10.1117/12.731140",
language = "English (US)",
isbn = "9780819467935",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Nanoengineering",
note = "Nanoengineering: Fabrication, Properties, Optics, and Devices IV ; Conference date: 27-08-2007 Through 30-08-2007",
}