Fabrication strategies for magnetic tunnel junctions with magnetoelectronic applications

Philip W.T. Pong, William F. Egelhoff

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

In this paper, two lithographic fabrication processes for magnetic tunnel junctions (MTJs) with different mask designs and etching technologies are discussed. The advantages and disadvantages of both processes are compared. The crucial steps to protect the oxide insulating barriers and avoid side-wall redepositions (which may lead to short circuits) are developed, and important design considerations of the mask patterns and the device geometric structures are elaborated. We show that implementing the strategies developed greatly increases the successful manufacturing yield of MTJ magnetoelectronics devices.

Original languageEnglish (US)
Title of host publicationNanoengineering
Subtitle of host publicationFabrication, Properties, Optics, and Devices IV
DOIs
StatePublished - 2007
Externally publishedYes
EventNanoengineering: Fabrication, Properties, Optics, and Devices IV - San Diego, CA, United States
Duration: Aug 27 2007Aug 30 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6645
ISSN (Print)0277-786X

Conference

ConferenceNanoengineering: Fabrication, Properties, Optics, and Devices IV
Country/TerritoryUnited States
CitySan Diego, CA
Period8/27/078/30/07

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Keywords

  • Etching
  • Ion milling
  • Lift-off resist
  • Lithography
  • Magnetic tunnel junction
  • Mask
  • Tunneling magnetoresistance

Fingerprint

Dive into the research topics of 'Fabrication strategies for magnetic tunnel junctions with magnetoelectronic applications'. Together they form a unique fingerprint.

Cite this