Field dependent electrical conduction in HfO2/SiO2 gate stack for before and after constant voltage stressing

S. K. Sahoo, D. Misra

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Fingerprint

Dive into the research topics of 'Field dependent electrical conduction in HfO2/SiO2 gate stack for before and after constant voltage stressing'. Together they form a unique fingerprint.

Keyphrases

Engineering

Material Science

Chemical Engineering