Skip to main navigation Skip to search Skip to main content

Field dependent electrical conduction in HfO2/SiO2 gate stack for before and after constant voltage stressing

Research output: Contribution to journal › Article › peer-review

16   Link opens in a new tab Scopus citations

Fingerprint

Dive into the research topics of 'Field dependent electrical conduction in HfO2/SiO2 gate stack for before and after constant voltage stressing'. Together they form a unique fingerprint.
Sort by

Keyphrases

Engineering

Material Science

Chemical Engineering