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Formation of silicon tips with <1 nm radius

  • R. B. Marcus
  • , T. S. Ravi
  • , T. Gmitter
  • , K. Chin
  • , D. Liu
  • , W. J. Orvis
  • , D. R. Ciarlo
  • , C. E. Hunt
  • , J. Trujillo

Research output: Contribution to journalArticlepeer-review

Abstract

Electron emitters in vacuum microelectronic devices need sharp tips in order to permit electron emission at moderate voltages. A method has been found for preparing uniform silicon tips with a radius of curvature less than 1 nm. These tips are formed by oxidation of 5-μm-high silicon cones through exploitation of a known oxidation inhibition of silicon at regions of high curvature.

Original languageEnglish (US)
Pages (from-to)236-238
Number of pages3
JournalApplied Physics Letters
Volume56
Issue number3
DOIs
StatePublished - 1990

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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