Keyphrases
High-k Dielectric
100%
PMOSFET
100%
Gate Dielectric
100%
Poly-Si
100%
Interface Effect
100%
Dielectric Interface
100%
Gate Electrode
87%
Hf-silicate
62%
Electrode Materials
37%
Metal Gate
37%
Oxides
25%
Input Noise
25%
Noise Performance
25%
Silicon Oxynitride (SiON)
25%
Financial Support
12%
CMOS Technology
12%
Density Profile
12%
Silica
12%
Undoped
12%
Gate Oxide
12%
MOSFET
12%
Low-frequency (LF) Noise
12%
Trap Density
12%
Work Function
12%
Gate Bias
12%
Strong Impact
12%
Frequency Exponent
12%
Scattering Effect
12%
Bulk Oxides
12%
NiSi
12%
Strong Inversion
12%
Si MOSFET
12%
Noise Properties
12%
Tunneling Distance
12%
Function Shift
12%
VT Shift
12%
HfO2 Dielectric
12%
Comparable Worth
12%
Drain Current Noise
12%
Poly Depletion
12%
Engineering
Dielectrics
100%
Metal-Oxide-Semiconductor Field-Effect Transistor
100%
Gate Dielectric
100%
Gate Electrode
100%
Metal Gate
42%
Noise Performance
28%
Scattering Effect
14%
Financial Support
14%
Environmental Control System
14%
Tunnel Construction
14%
Gate Oxide
14%
Constant Value
14%
Current Drain
14%
Gate Bias
14%
Strong Inversion
14%
Srinivasan
14%
Material Science
Dielectric Material
100%
High-K Dielectric
100%
Metal-Oxide-Semiconductor Field-Effect Transistor
100%
Silicate
45%
Oxide Compound
36%
Density
9%