Gate-dielectric interface effects on low-frequency (1/f) noise in p-MOSFETs with high-K dielectrics

P. Srinivasan, E. Simoen, R. Singanamalla, H. Y. Yu, C. Claeys, D. Misra

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Keyphrases

Engineering

Material Science