Global space charge effect in SCALPEL

M. Mkrtchyan; E. Munro; J. A. Liddle; S. T. Stanton; W. K. Waskiewicz; R. C. Farrow; V. Katsap

doi:10.1016/S0167-9317(00)00319-1

Global space charge effect in SCALPEL

M. Mkrtchyan, E. Munro, J. A. Liddle, S. T. Stanton, W. K. Waskiewicz, R. C. Farrow, V. Katsap

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

The global space charge (SC) effect in SCALPEL electron beam lithography system is investigated. First order properties of the SC lensing action (defocus and magnification change) in SCALPEL type projection systems are analyzed using a simple analytical technique. Aberrations induced by the lenses and SC in the projection optics are evaluated numerically using a Monte Carlo code developed to calculate the combined effect of Coulomb interactions and lens aberrations in the charge particle projection systems. We found that the defocus and the magnification change induced by SC are functions of two parameters, the beam perveance and the SCALPEL aperture size, that are critical for the system performance. The strong correlation identified between the best focus plane location and the aberrations induced by SC indicates that the SC lensing action can be effectively compensated by simply adjusting either the wafer plane position or excitations of projection lenses.

Original language	English (US)
Pages (from-to)	299-302
Number of pages	4
Journal	Microelectronic Engineering
Volume	53
Issue number	1
DOIs	https://doi.org/10.1016/S0167-9317(00)00319-1
State	Published - Jun 2000
Externally published	Yes

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/S0167-9317(00)00319-1

Cite this

@article{58932789a94547f5af5502efaf1a579f,

title = "Global space charge effect in SCALPEL",

abstract = "The global space charge (SC) effect in SCALPEL electron beam lithography system is investigated. First order properties of the SC lensing action (defocus and magnification change) in SCALPEL type projection systems are analyzed using a simple analytical technique. Aberrations induced by the lenses and SC in the projection optics are evaluated numerically using a Monte Carlo code developed to calculate the combined effect of Coulomb interactions and lens aberrations in the charge particle projection systems. We found that the defocus and the magnification change induced by SC are functions of two parameters, the beam perveance and the SCALPEL aperture size, that are critical for the system performance. The strong correlation identified between the best focus plane location and the aberrations induced by SC indicates that the SC lensing action can be effectively compensated by simply adjusting either the wafer plane position or excitations of projection lenses.",

author = "M. Mkrtchyan and E. Munro and Liddle, {J. A.} and Stanton, {S. T.} and Waskiewicz, {W. K.} and Farrow, {R. C.} and V. Katsap",

note = "Funding Information: This work was partially supported by DARPA and International SEMA TECH.",

year = "2000",

month = jun,

doi = "10.1016/S0167-9317(00)00319-1",

language = "English (US)",

volume = "53",

pages = "299--302",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier B.V.",

number = "1",

}

TY - JOUR

T1 - Global space charge effect in SCALPEL

AU - Mkrtchyan, M.

AU - Munro, E.

AU - Liddle, J. A.

AU - Stanton, S. T.

AU - Waskiewicz, W. K.

AU - Farrow, R. C.

AU - Katsap, V.

N1 - Funding Information: This work was partially supported by DARPA and International SEMA TECH.

PY - 2000/6

Y1 - 2000/6

N2 - The global space charge (SC) effect in SCALPEL electron beam lithography system is investigated. First order properties of the SC lensing action (defocus and magnification change) in SCALPEL type projection systems are analyzed using a simple analytical technique. Aberrations induced by the lenses and SC in the projection optics are evaluated numerically using a Monte Carlo code developed to calculate the combined effect of Coulomb interactions and lens aberrations in the charge particle projection systems. We found that the defocus and the magnification change induced by SC are functions of two parameters, the beam perveance and the SCALPEL aperture size, that are critical for the system performance. The strong correlation identified between the best focus plane location and the aberrations induced by SC indicates that the SC lensing action can be effectively compensated by simply adjusting either the wafer plane position or excitations of projection lenses.

AB - The global space charge (SC) effect in SCALPEL electron beam lithography system is investigated. First order properties of the SC lensing action (defocus and magnification change) in SCALPEL type projection systems are analyzed using a simple analytical technique. Aberrations induced by the lenses and SC in the projection optics are evaluated numerically using a Monte Carlo code developed to calculate the combined effect of Coulomb interactions and lens aberrations in the charge particle projection systems. We found that the defocus and the magnification change induced by SC are functions of two parameters, the beam perveance and the SCALPEL aperture size, that are critical for the system performance. The strong correlation identified between the best focus plane location and the aberrations induced by SC indicates that the SC lensing action can be effectively compensated by simply adjusting either the wafer plane position or excitations of projection lenses.

UR - http://www.scopus.com/inward/record.url?scp=0034205515&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0034205515&partnerID=8YFLogxK

U2 - 10.1016/S0167-9317(00)00319-1

DO - 10.1016/S0167-9317(00)00319-1

M3 - Article

AN - SCOPUS:0034205515

SN - 0167-9317

VL - 53

SP - 299

EP - 302

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 1

ER -

Global space charge effect in SCALPEL

Abstract

All Science Journal Classification (ASJC) codes

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