Grain enhancement of polycrystalline silicon films aided by optical excitation

B. L. Sopori, W. Chen, J. Alleman, R. Matson, N. M. Ravindra, T. Y. Tan

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations


A new technique for making large-grain thin Si films is described in which optical excitation is used to enhance the grain growth. Grain sizes much larger than the film thickness can be obtained at low temperatures and in short process times. This method is well suited for making thin-film Si solar cells on low-temperature substrates.

Original languageEnglish (US)
Pages (from-to)95-100
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
StatePublished - 1998
Externally publishedYes
EventProceedings of the 1997 MRS Fall Meeting - Boston, MA, USA
Duration: Dec 2 1997Dec 5 1997

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering
  • General Materials Science


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