A new technique for making large-grain thin Si films is described in which optical excitation is used to enhance the grain growth. Grain sizes much larger than the film thickness can be obtained at low temperatures and in short process times. This method is well suited for making thin-film Si solar cells on low-temperature substrates.
|Number of pages
|Materials Research Society Symposium - Proceedings
|Published - Jan 1 1998
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials