Grain enhancement of polycrystalline silicon films aided by optical excitation

B. L. Sopori; W. Chen; J. Alleman; R. Matson; N. Ravindra; T. Y. Tan

Grain enhancement of polycrystalline silicon films aided by optical excitation

B. L. Sopori, W. Chen, J. Alleman, R. Matson, N. Ravindra, T. Y. Tan

Research output: Contribution to journal › Article › peer-review

Abstract

A new technique for making large-grain thin Si films is described in which optical excitation is used to enhance the grain growth. Grain sizes much larger than the film thickness can be obtained at low temperatures and in short process times. This method is well suited for making thin-film Si solar cells on low-temperature substrates.

Original language	English (US)
Pages (from-to)	95-100
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	485
State	Published - Jan 1 1998
Externally published	Yes

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials

Cite this

@article{fa89f5dc149e45eaa40d40498ede2fe6,

title = "Grain enhancement of polycrystalline silicon films aided by optical excitation",

abstract = "A new technique for making large-grain thin Si films is described in which optical excitation is used to enhance the grain growth. Grain sizes much larger than the film thickness can be obtained at low temperatures and in short process times. This method is well suited for making thin-film Si solar cells on low-temperature substrates.",

author = "Sopori, {B. L.} and W. Chen and J. Alleman and R. Matson and N. Ravindra and Tan, {T. Y.}",

year = "1998",

month = jan,

day = "1",

language = "English (US)",

volume = "485",

pages = "95--100",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

}

TY - JOUR

T1 - Grain enhancement of polycrystalline silicon films aided by optical excitation

AU - Sopori, B. L.

AU - Chen, W.

AU - Alleman, J.

AU - Matson, R.

AU - Ravindra, N.

AU - Tan, T. Y.

PY - 1998/1/1

Y1 - 1998/1/1

N2 - A new technique for making large-grain thin Si films is described in which optical excitation is used to enhance the grain growth. Grain sizes much larger than the film thickness can be obtained at low temperatures and in short process times. This method is well suited for making thin-film Si solar cells on low-temperature substrates.

AB - A new technique for making large-grain thin Si films is described in which optical excitation is used to enhance the grain growth. Grain sizes much larger than the film thickness can be obtained at low temperatures and in short process times. This method is well suited for making thin-film Si solar cells on low-temperature substrates.

UR - http://www.scopus.com/inward/record.url?scp=0031617474&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031617474&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0031617474

SN - 0272-9172

VL - 485

SP - 95

EP - 100

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

ER -

Grain enhancement of polycrystalline silicon films aided by optical excitation

Abstract

All Science Journal Classification (ASJC) codes

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