High rate photochemical deposition of amorphous silicon from higher silanes

A. E. Delahoy

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

The deposition rate of hydrogenated amorphous silicon prepared by mercury-sensitized photo-CVD of silanes has been increased through the use of perfluorinated window coatings and small window-substrate separations. Observations regarding the deposition rate and its time dependence are qualitatively explained by a model involving two surfaces with greatly different sticking coefficients for the deposition precursors. The films are characterized by band gap, conductivity, IR absorption, photoluminescence, ESR, and diffusion length measurements.

Original languageEnglish (US)
Pages (from-to)833-836
Number of pages4
JournalJournal of Non-Crystalline Solids
Volume77-78
Issue numberPART 2
DOIs
StatePublished - Dec 2 1985

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Condensed Matter Physics
  • Materials Chemistry

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